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US Patent Issued to International Business Machines on July 14 for "Interconnect through gate cut for stacked FET device" (New York, Vermont Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,136, issued on July 14, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Interconnect through gate cut for stacked FE... Read More


US Patent Issued to INTERNATIONAL BUSINESS MACHINES on July 14 for "Wire structure for low resistance interconnects" (New York Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,137, issued on July 14, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.). "Wire structure for low resistance interconne... Read More


US Patent Issued to NANYA TECHNOLOGY on July 14 for "Semiconductor device with assisting layer and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,138, issued on July 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device with assisting layer and me... Read More


US Patent Issued to NANYA TECHNOLOGY on July 14 for "Interconnection structure and method for manufacturing the same" (Taiwanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,139, issued on July 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan). "Interconnection structure and method for manufacturin... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on July 14 for "Contact arrangements for deep trench capacitors" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,140, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Contact arrangements for deep trenc... Read More


US Patent Issued to UNITED MICROELECTRONICS on July 14 for "Semiconductor structure and fabrication method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,141, issued on July 14, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan). "Semiconductor structure and fabrication met... Read More


US Patent Issued to NANYA TECHNOLOGY on July 14 for "Method for preparing semiconductor device with air spacer" (Taiwanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,142, issued on July 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method for preparing semiconductor device with a... Read More


US Patent Issued to GlobalFoundries Singapore on July 14 for "Semiconductor devices including an air gap adjacent to an interconnect structure and methods of forming the same" (Singaporean Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,143, issued on July 14, was assigned to GlobalFoundries Singapore Pte. Ltd. (Singapore). "Semiconductor devices including an air gap adjace... Read More


US Patent Issued to NANYA TECHNOLOGY on July 14 for "Semiconductor device with filling layer" (Taiwanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,144, issued on July 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei, Taiwan). "Semiconductor device with filling layer" was invented... Read More


US Patent Issued to NANYA TECHNOLOGY on July 14 for "Semiconductor device with filling layer and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,145, issued on July 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device with filling layer and meth... Read More